Innovation That Breaks the Performance Barrier

Intel® 45nm high-k metal gate silicon technology is the next-generation Intel® Core™ microarchitecture. With roughly twice the density of Intel® 65nm technology, Intel's 45nm packs about double the number of transistors into the same silicon space. That's more than 400 million transistors for dual-core processors and more than 800 million for quad-core. Intel's 45nm technology enables great performance leaps, up to 50-percent larger L2 cache, and new levels of breakthrough energy efficiency.