Taking great leaps forward in transistor design

Using a combination of new materials including hafnium-based high-k gate dielectrics and metal gates, Intel 45nm technology represents a major milestone as the industry as a whole races to reduce electrical current leakage in transistors—a growing problem for chip manufacturers as transistors get even smaller.

This new transistor breakthrough allows Intel to continue delivering record-breaking PC, laptop, and server processor speeds well into the future. It also ensures that Moore's Law—a high-tech industry axiom that transistor counts double about every two years to deliver more performance and functionality at decreasing cost—thrives well into the next decade.